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Planarization in Electrochemically Fabricated Nanodimensional Films
- Source :
- The Journal of Physical Chemistry C. 112:7318-7325
- Publication Year :
- 2008
- Publisher :
- American Chemical Society (ACS), 2008.
-
Abstract
- Recent demonstrations of electrochemical fabrication of nanodimensional, alternating metal and metal oxide films open a pathway to nanoscale templating with high-quality interfaces and high uniformity over macroscopic surface areas. Planarization during electrochemical oxidation is the critical enabling feature of this growth process. Here we present a theory and simulation of this planarization phenomenon applicable to a wide range of initial surface profiles and material systems. We describe the impact of different system parameters on the rate of planarization for both the exposed oxide surface and the internal metal oxide interface. Finally, we show that our simulations are consistent with experimental measurements of Ta 2 O 5 electrochemically grown on Ta thin films.
- Subjects :
- Materials science
Fabrication
Oxide
Nanotechnology
Electrochemistry
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Metal
chemistry.chemical_compound
General Energy
chemistry
Chemical-mechanical planarization
visual_art
System parameters
visual_art.visual_art_medium
Physical and Theoretical Chemistry
Thin film
Nanoscopic scale
Subjects
Details
- ISSN :
- 19327455 and 19327447
- Volume :
- 112
- Database :
- OpenAIRE
- Journal :
- The Journal of Physical Chemistry C
- Accession number :
- edsair.doi...........13898d7cfb6f0260a90eb2a5df92a438