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Monte Carlo Simulation of Plasma Etch Emission Endpoint

Authors :
Edward J. Bawolek
Publication Year :
2008
Publisher :
ASTM International, 2008.

Subjects

Subjects :
Materials science
Plasma etching
Monte Carlo method
Computational physics

Details

Database :
OpenAIRE
Accession number :
edsair.doi...........12fae54cdaabbcfd5cbecb9ffb5735d0
Full Text :
https://doi.org/10.1520/stp25751s
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