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Simulation of thin film growth and in situ characterization by RHEED and photoemission
- Source :
- Vacuum. 46:931-934
- Publication Year :
- 1995
- Publisher :
- Elsevier BV, 1995.
-
Abstract
- Simulations of epitaxial growth of GaAs associated with RHEED intensity and photoemission current, as in situ characterization techniques, have been performed. The nature of incoming species which can be of atomic or molecular form is taken into account. The simulations show in phase RHEED and photoemission oscillations, in agreement with experimental results.
- Subjects :
- In situ
Reflection high-energy electron diffraction
Condensed matter physics
Chemistry
Semiconductor materials
Analytical chemistry
Condensed Matter Physics
Epitaxy
Surfaces, Coatings and Films
Characterization (materials science)
Phase (matter)
Thin film
Instrumentation
Molecular beam epitaxy
Subjects
Details
- ISSN :
- 0042207X
- Volume :
- 46
- Database :
- OpenAIRE
- Journal :
- Vacuum
- Accession number :
- edsair.doi...........12dfc63a6d9c672f35d373764987f9ea
- Full Text :
- https://doi.org/10.1016/0042-207x(95)00075-5