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Ultraviolet photon-induced heteroepitaxy of CdTe on GaAs
- Source :
- Journal of Materials Research. 3:1144-1150
- Publication Year :
- 1988
- Publisher :
- Springer Science and Business Media LLC, 1988.
-
Abstract
- Ultraviolet photon-induced metalorganic vapor phase epitaxy of CdTe films on GaAs substrates has been investigated using diethyltelluride and dimethylcadmium as the precursor gases. The relationship between the deposition parameters and the properties of the epilayers have been examined using transmission electron microscopy and x-ray rocking curves. Epilayers grown at 6μm/h show an x-ray double-crystal rocking curve full width at half-maximum (FWHM) of 250 arcsec.
- Subjects :
- Materials science
Photon
business.industry
Mechanical Engineering
Dimethylcadmium
Condensed Matter Physics
medicine.disease_cause
Epitaxy
Cadmium telluride photovoltaics
chemistry.chemical_compound
Full width at half maximum
chemistry
Mechanics of Materials
Transmission electron microscopy
medicine
Optoelectronics
General Materials Science
business
Ultraviolet
Deposition (law)
Subjects
Details
- ISSN :
- 20445326 and 08842914
- Volume :
- 3
- Database :
- OpenAIRE
- Journal :
- Journal of Materials Research
- Accession number :
- edsair.doi...........12a323d6f8b0f2c02af84d77a9f6f632
- Full Text :
- https://doi.org/10.1557/jmr.1988.1144