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Electrical Instability of a-In–Ga–Zn–O TFTs Biased Below Accumulation Threshold
- Source :
- Electrochemical and Solid-State Letters. 12:J101
- Publication Year :
- 2009
- Publisher :
- The Electrochemical Society, 2009.
-
Abstract
- The electrical instability in thin-film transistors (TFTs) based on amorphous indium-gallium-zinc oxide (a-IGZO) was investigated using constant bias and constant current stress. Stress conditions were chosen such that TFT is turned on, whereas the potential at the gate dielectric-a-IGZO interface is below the electron accumulation threshold. Drain current in this low bias regime is still sufficient for driving pixels in an organic light-emitting diode display (AMOLED). We found that the degradation is due to charge trapping near the a-IGZO-gate dielectric interface. The obtained results enabled a straightforward assessment of a-IGZO TFTs' instability for their application in AMOLEDs.
- Subjects :
- Materials science
business.industry
General Chemical Engineering
Transistor
Dielectric
Electron
Instability
law.invention
Amorphous solid
AMOLED
law
Thin-film transistor
Electrochemistry
Optoelectronics
General Materials Science
Electrical and Electronic Engineering
Physical and Theoretical Chemistry
business
Diode
Subjects
Details
- ISSN :
- 10990062
- Volume :
- 12
- Database :
- OpenAIRE
- Journal :
- Electrochemical and Solid-State Letters
- Accession number :
- edsair.doi...........10bafd21bd5643ebacec57703c19362a