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Direct molecular beam epitaxial growth of low-dimensional structures on reactive ion etched surfaces

Authors :
W. Klein
G. Tränkle
H. Kratzer
G. Weimann
G. Böhm
T. Röhr
Source :
Journal of Crystal Growth. 150:306-310
Publication Year :
1995
Publisher :
Elsevier BV, 1995.

Abstract

Quasi-one-dimensional GaAs structures were fabricated by molecular beam epitaxial regrowth on dry etched (AlGa)As surfaces, making use of the “self-adjusted” facetted growth on structured surfaces. The increased migration lengths and decreased sticking coefficients of the ad-atoms on higher indexed crystal planes lead to the formation of triangular, sharply peaked ridges with perfectly smooth sidewalls, having lateral dimensional fluctuations on the atomic scale over lengths of several 100 μm. The epitaxial deposition of a quantum well, i.e. a thin GaAs layer between (AlGa)As barriers, results in the direct growth of one-dimensional quantum wire structures at the vertex of the peaked ridges. The size of the GaAs wires can be controlled by the amount of Ga deposited between the (AlGa)As barriers. These one-dimensional structures show high yield in cathodoluminescence, without spectral shift over regions of hundreds of microns. Additional peaks in the CL spectra demonstrate the two-dimensional confinement of the quantum wires. Three-dimensionally confined quantum dots, also showing high luminescence yield, were found at the top of pyramidal structures grown on square mesas.

Details

ISSN :
00220248
Volume :
150
Database :
OpenAIRE
Journal :
Journal of Crystal Growth
Accession number :
edsair.doi...........10abf153710d8405d3a17d0d9dcc7746
Full Text :
https://doi.org/10.1016/0022-0248(95)80225-2