Tailored molecular glass resists for scanning probe lithography

MLA

Jean-Francois de Marneffe, et al. “Tailored Molecular Glass Resists for Scanning Probe Lithography.” Advances in Patterning Materials and Processes XXXII, Mar. 2015. EBSCOhost, https://doi.org/10.1117/12.2085734.

APA

Jean-Francois de Marneffe, Hans-Werner Schmidt, Marcus Kaestner, Yana Krivoshapkina, Andreas Erich Schedl, Urs Dürig, Vincent Fokkema, Tristan Kolb, Peter Strohriegl, Ziad el Otell, Mike Cooke, Colin Rawlings, Marijn G. A. van Veghel, Andreas Ringk, Ivo W. Rangelow, Christian Neuber, Armin W. Knoll, & Matthias Budden. (2015). Tailored molecular glass resists for scanning probe lithography. Advances in Patterning Materials and Processes XXXII. https://doi.org/10.1117/12.2085734

Chicago

Jean-Francois de Marneffe, Hans-Werner Schmidt, Marcus Kaestner, Yana Krivoshapkina, Andreas Erich Schedl, Urs Dürig, Vincent Fokkema, et al. 2015. “Tailored Molecular Glass Resists for Scanning Probe Lithography.” Advances in Patterning Materials and Processes XXXII, March. doi:10.1117/12.2085734.