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Scissionable polymer photoresist for EUV lithography
- Source :
- Advances in Patterning Materials and Processes XXXIX.
- Publication Year :
- 2022
- Publisher :
- SPIE, 2022.
Details
- Database :
- OpenAIRE
- Journal :
- Advances in Patterning Materials and Processes XXXIX
- Accession number :
- edsair.doi...........0fc29ef8d1ea03c01e67ceefe8585557