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Embedded STT-MRAM in 28-nm FDSOI Logic Process for Industrial MCU/IoT Application

Authors :
Yongsung Ji
Gitae Jeong
Joo-Chan Kim
Seungbae Lee
Daesop Lee
Yong-Kyu Lee
Hyun-Taek Jung
Ki-Chul Park
Hwang So-Hee
Artur Antonyan
Kwanhyeob Koh
J.W. Lee
Yoon-Jong Song
Hyeongsun Hong
Kilho Lee
Ung-hwan Pi
Ki-Hyun Hwang
Jung-Man Lim
Jong Shik Yoon
Hyunsung Jung
Daehyun Jang
Mark Pyo
Bo-Young Seo
SangHumn Lee
E. S. Jung
Byoung-Jae Bae
Hyunchul Shin
Oh Se-Chung
Source :
2018 IEEE Symposium on VLSI Technology.
Publication Year :
2018
Publisher :
IEEE, 2018.

Abstract

We demonstrate, for the first time, 28-nm embedded STT-MRAM operating at full industrial temperature range (−40~125°C) with >1E+6 endurance and >10 year retention for high speed MCU/IoT application. Robust cell operation is also demonstrated after solder reflow (260°C, 90 second) and during external magnetic disturbance (550-Oe under writing). It is built on 28-nm FDSOI technology in modular format for IP reuse and has great potential to serve wide variety of applications such as IoT, and high performance MCU.

Details

Database :
OpenAIRE
Journal :
2018 IEEE Symposium on VLSI Technology
Accession number :
edsair.doi...........0f4b5a2ce996887b82fc42cbf625362c
Full Text :
https://doi.org/10.1109/vlsit.2018.8510623