Enhanced Surface Passivation by Atomic Layer-Deposited Al2O3 for Ultraviolet-Sensitive Silicon Photomultipliers

MLA

Yuguo Tao, and Anna Erickson. “Enhanced Surface Passivation by Atomic Layer-Deposited Al2O3 for Ultraviolet-Sensitive Silicon Photomultipliers.” IEEE Transactions on Nuclear Science, vol. 69, Feb. 2022, pp. 187–91. EBSCOhost, https://doi.org/10.1109/tns.2022.3141991.

APA

Yuguo Tao, & Anna Erickson. (2022). Enhanced Surface Passivation by Atomic Layer-Deposited Al2O3 for Ultraviolet-Sensitive Silicon Photomultipliers. IEEE Transactions on Nuclear Science, 69, 187–191. https://doi.org/10.1109/tns.2022.3141991

Chicago

Yuguo Tao, and Anna Erickson. 2022. “Enhanced Surface Passivation by Atomic Layer-Deposited Al2O3 for Ultraviolet-Sensitive Silicon Photomultipliers.” IEEE Transactions on Nuclear Science 69 (February): 187–91. doi:10.1109/tns.2022.3141991.