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High energy focused ion beam lithography using P-beam writing

Authors :
Bibhudutta Rout
Gary A. Glass
John A. Peeples
Alexander D. Dymnikov
Richard R. Greco
J. R. Reinhardt
Mithun Kamal
Source :
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 241:397-401
Publication Year :
2005
Publisher :
Elsevier BV, 2005.

Abstract

The term “P-beam writing” is used to describe the technique of using focused high energy proton microbeams for micro or nanofabrication applications. The P-beam technique can be used to rapidly fabricate three-dimensional, high aspect ratio microstructures in a variety of materials without the use of masks and it is proving to be a versatile lithographic method. Recent developments in the application P-beam writing of microstructures at the Louisiana Accelerator Center are presented.

Details

ISSN :
0168583X
Volume :
241
Database :
OpenAIRE
Journal :
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Accession number :
edsair.doi...........0e748f5c97db8987428f560770fbb7c2