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3D copper TSV integration, testing and reliability

Authors :
Michael J. Shapiro
Mukta G. Farooq
William F. Landers
Robert Hannon
Daniel Berger
S.S. Iyer
Troy L. Graves-Abe
F. Chen
R. Liptak
Kevin R. Winstel
Benjamin Himmel
Richard P. Volant
John M. Safran
P.S. Andry
Edmund J. Sprogis
Kevin S. Petrarca
Cornelia K. Tsang
Timothy D. Sullivan
Chandrasekharan Kothandaraman
Source :
2011 International Electron Devices Meeting.
Publication Year :
2011
Publisher :
IEEE, 2011.

Abstract

Node-agnostic Cu TSVs integrated with high-K/metal gate and embedded DRAM were used in functional 3D modules. Thermal cycling and stress results show no degradation of TSV or BEOL structures, and device and functional data indicate that there is no significant impact from TSV processing and/or proximity.

Details

Database :
OpenAIRE
Journal :
2011 International Electron Devices Meeting
Accession number :
edsair.doi...........0e539b2c203f93525e69ce3527b3369c