Influence of systematic errors in spectral photometric measurements on the determination of optical thin film parameters

Authors :: Michael A. Kokarev
Michael K. Trubetskov
Angela Duparré
Alexander V. Tikhonravov
Tatiana V. Amotchkina
Source :: Optical Interference Coatings.
Publication Year :: 2001
Publisher :: OSA, 2001.
Abstract: Results of the optical characterization of dielectric thin films depend on the quality of experimental data. This work investigates the iinfluence of systematic errors in measurement data on the determination of thin film parameters.

Subjects :: Systematic error
Materials science
genetic structures
business.industry
Experimental data
Optical thin film
eye diseases
Characterization (materials science)
Quality (physics)
Optics
Transmittance
sense organs
Thin film
business
Refractive index

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