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Bulk Micromachining of Si by Annealing-Driven Magnetically Guided Metal-Assisted Chemical Etching
- Source :
- ACS Applied Electronic Materials. 2:260-267
- Publication Year :
- 2020
- Publisher :
- American Chemical Society (ACS), 2020.
-
Abstract
- Herein, the bulk micromachining of Si by a magnetically guided metal-assisted chemical etching (MACE) process is demonstrated. To improve the etching performance of Si, a trilayer metal catalyst (A...
Details
- ISSN :
- 26376113
- Volume :
- 2
- Database :
- OpenAIRE
- Journal :
- ACS Applied Electronic Materials
- Accession number :
- edsair.doi...........0dbf716b76615effd612651a2b703748