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Bulk Micromachining of Si by Annealing-Driven Magnetically Guided Metal-Assisted Chemical Etching

Authors :
Sungho Jin
Yu-Chan Kim
Ju-Young Kim
Tae Kyoung Kim
Dong Won Chun
Jee-Hwan Bae
Source :
ACS Applied Electronic Materials. 2:260-267
Publication Year :
2020
Publisher :
American Chemical Society (ACS), 2020.

Abstract

Herein, the bulk micromachining of Si by a magnetically guided metal-assisted chemical etching (MACE) process is demonstrated. To improve the etching performance of Si, a trilayer metal catalyst (A...

Details

ISSN :
26376113
Volume :
2
Database :
OpenAIRE
Journal :
ACS Applied Electronic Materials
Accession number :
edsair.doi...........0dbf716b76615effd612651a2b703748