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Annealing effects in plated-wire memory elements, part II: Recrystallization in permalloy films
- Source :
- IEEE Transactions on Magnetics. 7:858-860
- Publication Year :
- 1971
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 1971.
-
Abstract
- Results of grain-size measurements in Permalloy platings suggest that recrystallization is possible at temperatures as low as 200°C, but that it is an extremely heterogeneous process. No worthwhile correlation was found to exist between observed grain size and magnetic dispersion in samples aged in the temperature range 180 and 230°C, and it is suggested that the magnetic aging which occurs under these conditions may be due to some other diffusion-controlled process than recrystallization; a process such as chemical homogenization is tentatively preferred.
- Subjects :
- Permalloy
Materials science
Annealing (metallurgy)
Recrystallization (metallurgy)
Atmospheric temperature range
Grain size
Electronic, Optical and Magnetic Materials
law.invention
Optical microscope
law
Dynamic recrystallization
Electrical and Electronic Engineering
Composite material
Electroplating
Subjects
Details
- ISSN :
- 00189464
- Volume :
- 7
- Database :
- OpenAIRE
- Journal :
- IEEE Transactions on Magnetics
- Accession number :
- edsair.doi...........0bd93f72cc9c89dbeba7af813194b3de
- Full Text :
- https://doi.org/10.1109/tmag.1971.1067239