Organosilicon plasma polymers deposited in trimethylsilyl acetate/CH4 plasma of capacitively coupled RF glow discharge

Thin solid films based on organosilicon monomers are perspective in many branches of industry as well as for bioapplications. In the present study, plasma of RF capacitively coupled glow discharge in gaseous mixture of trimethylsilyl acetate (TMSA) monomer and methane was used to create SiOxCyHz coatings. This study monitors properties of resulting thin films (surface chemistry, wettability, surface structure and mechanical properties) in dependency on deposition parameters. The main subject of the presented research is the investigation of the relationship between the above-mentioned properties of prepared organosilicon coatings and the flow rate ratio of TMSA monomer and CH4 carrier gas applied during deposition process.