Suppression of Phosphorous Out-Diffusion in PH3 Plasma Immersion Ion-Implanted Germanium Epilayer Grown on Silicon (100) Substrate through SiOx Capping Layer

Authors :: Sung-Nam Lee
Daeyoon Baek
Chel-Jong Choi
Woong-Ki Hong
Kyu-Hwan Shim
Source :: MATERIALS TRANSACTIONS. 61:195-199
Publication Year :: 2020
Publisher :: Japan Institute of Metals, 2020.

Subjects :: Materials science
Silicon
Mechanical Engineering
Diffusion
Inorganic chemistry
chemistry.chemical_element
Germanium
Plasma
Substrate (electronics)
Condensed Matter Physics
Plasma-immersion ion implantation
Ion
chemistry
Mechanics of Materials
General Materials Science
Layer (electronics)

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