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Low-frequency noise measurements on semiconductor devices using a probe station

Authors :
L. R. Chaar
A. D. van Rheenen
Source :
IEEE Transactions on Instrumentation and Measurement. 43:658-660
Publication Year :
1994
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 1994.

Abstract

We report a measurement technique that would allow the mapping of the low-frequency noise characteristics of devices across a wafer. We show that we can reliably measure the noise by using a probe station. We also show that the sensitivity of the setup is not limited by the probes. >

Subjects

Subjects :
Engineering
Noise measurement
business.industry
Infrasound
Acoustics
Electrical engineering
Semiconductor device
Noise (electronics)
law.invention
law
Mechanical probe station
Wafer
Electrical and Electronic Engineering
Resistor
business
Instrumentation
Sensitivity (electronics)

Details

ISSN :
00189456
Volume :
43
Database :
OpenAIRE
Journal :
IEEE Transactions on Instrumentation and Measurement
Accession number :
edsair.doi...........06d1e08f9b9e31c97de080404ddfc046
Full Text :
https://doi.org/10.1109/19.310184
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