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Masks for Markle-Dyson optics

Authors :
David A. Borkholder
Roger Fabian W. Pease
G. Owen
A. Grenville
Curtis W. Frank
Jeff A. Robinson
D. A. Markle
Source :
SPIE Proceedings.
Publication Year :
1994
Publisher :
SPIE, 1994.

Abstract

The optical performance of Markle-Dyson projection optics is now well established. Here we describe options for 1X reflective optical masks that might achieve the desired linewidth control. One option is the use of aluminum as the reflecting material. A film less than 50 nm thick has nearly twice the reflectivity of the silicon used until now, and so it should be possible to develop an etching process (for such a thin film) that is adequately precise. Moreover options exist for repairing both opaque and clear defects. An interesting alternative configuration, that eliminates the need to etch the aluminum, is to use a patterned absorber on the substrate and to deposit the aluminum over the patterned absorber.

Details

ISSN :
0277786X
Database :
OpenAIRE
Journal :
SPIE Proceedings
Accession number :
edsair.doi...........06bb4f17cfcd4cd7e622890288e7a2c8
Full Text :
https://doi.org/10.1117/12.167246