Analysis of beam interference reflected from atomic force microscope tip and periodic silicon surface under various humidity conditions

Dynamical sensing based on combination of classical optical effects and atomic force microscopy (AFM) presents challenge for analysis of the forces at the nanoscale and beyond. An interference effect between light reflected from an AFM cantilever and highly reflective silicon surface of the calibration grating was studied for relative humidity (RH) varied between 9 and 60%. Force-distance analysis indicates on separation of capillary, van der Waals, adhesion, and electrostatic forces. The measurements performed in contact AFM mode suggest that the period of interference pattern observed in displacement curves is a function of humidity and varies between 293 nm at RH = 9% and 335 nm at RH > 50% with standard deviation less than 8 nm. Clear change of the interference period suggests that other than hardwarerelated factors may be involved in the formation of the interference in force-distance curves.