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A study of the FeSi(100) surface by X-ray photoelectron diffraction and low-energy ion scattering

Authors :
Michail Vasiliev
Ugo Bardi
Viktor Martynyuk
Andrea Atrei
Gianfranco Rovida
Marco Torrini
I. Spolveri
Source :
Surface Science. 419:303-307
Publication Year :
1999
Publisher :
Elsevier BV, 1999.

Abstract

A single-crystal FeSi(100) sample has been studied by means of X-ray photoelectron diffraction (XPD) and low-energy ion scattering (LEIS) in order to investigate the structure and the composition of the outermost atomic layers. XPD intensity plots for the Fe 2p and Si 2s core levels were acquired, and the experimental results were compared with theoretical calculations. Good agreement was found for the bulk-like surface model. The LEIS results indicate that the surface is silicon-terminated.

Details

ISSN :
00396028
Volume :
419
Database :
OpenAIRE
Journal :
Surface Science
Accession number :
edsair.doi...........05809a682c7bec04039eb671bc489198
Full Text :
https://doi.org/10.1016/s0039-6028(98)00808-5