Impact of mask making imperfections on the performance of matching critical sub-circuit blocks

In this paper, we present an investigation of the impact of mask making imperfections on matching. Comparing optically measured and electrically derived data for line width errors allows pinpointing whether or not the mask limits the best achievable device matching. Treating matching critical sub-circuit blocks themselves as test structures, we demonstrate a direct methodology for assessing the impact of process and mask on the performance of high-precision analog products.