Tailored synthesized silsesquioxane based resists for UV assisted nanoimprint lithography

Authors :: Chouiki, M.
Kehagias, N.
Zelsmann, M.
Schoeftner, R.
Sotomayor Torres, C.M
Laboratoire des technologies de la microélectronique (LTM)
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)
Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)
Clot, Marielle
Source :: Electron, Ion, and Photon Beam technology and Nanofabrication conference-EIPBN 2011, Electron, Ion, and Photon Beam technology and Nanofabrication conference-EIPBN 2011, May 2011, Las Vegas (USA), United States
Publication Year :: 2011
Publisher :: HAL CCSD, 2011.
Abstract: International audience

Language :: English
Database :: OpenAIRE
Journal :: Electron, Ion, and Photon Beam technology and Nanofabrication conference-EIPBN 2011, Electron, Ion, and Photon Beam technology and Nanofabrication conference-EIPBN 2011, May 2011, Las Vegas (USA), United States
Accession number :: edsair.dedup.wf.001..febff01d31b24b64e1ce636db2661183

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