Interaction Mechanisms between ArO2 Post-discharge and Biphenyl

Authors :: Dal'Maz Silva, Walter
Belmonte, Thierry
Duday, David
Frache, Gilles
Noël, Cédric
Choquet, Patrick
Migeon, Henri-Noël
Maliska, Ana Maria
Institut Jean Lamour (IJL)
Université de Lorraine (UL)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)
Centre de Recherche Public - Gabriel Lippmann (LUXEMBOURG)
Luxembourg Institute of Science and Technology (LIST)
Materials Research and Technology (MRT) Department, Luxembourg Institute of Science and Technology (LIST)
Source :: Plasma Processes and Polymers, Plasma Processes and Polymers, Wiley-VCH Verlag, 2012, 9 (2), pp.207-216. ⟨10.1002/ppap.201100119⟩
Publication Year :: 2012
Publisher :: HAL CCSD, 2012.
Abstract: International audience

Subjects :: [SPI.PLASMA]Engineering Sciences [physics]/Plasmas
ComputingMilieux_MISCELLANEOUS

Language :: English
ISSN :: 16128850 and 16128869
Database :: OpenAIRE
Journal :: Plasma Processes and Polymers, Plasma Processes and Polymers, Wiley-VCH Verlag, 2012, 9 (2), pp.207-216. ⟨10.1002/ppap.201100119⟩
Accession number :: edsair.dedup.wf.001..fb7b00e1ac95ea1a537f8baed8c01005
Full Text :: https://doi.org/10.1002/ppap.201100119⟩