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PROPERTIES OF MICROCRYSTALLINE SILICON THIN FILMS DEPOSITED AT HIGH RATE BY PECVD
- Authors :
- Rava, P.
Ambrosone, G.
Coscia, U.
Ambrico, M.
Basa, D. K.
luciano scaltrito
Elena Tresso
G. Willeke, H. Ossenbrink, P.Helm
P., Rava
Ambrosone, Giuseppina
Coscia, Ubaldo
M., Ambrico
D. K., Basa
L., Scaltrito
E., Tresso
- Source :
- Politecnico di Torino-IRIS
- Publication Year :
- 2007
- Publisher :
- Wip-renawable energies, 2007.
Details
- Database :
- OpenAIRE
- Journal :
- Politecnico di Torino-IRIS
- Accession number :
- edsair.dedup.wf.001..f8267b61cef11d5f93ce905c1efa06fa