'Plasma/reactor walls interactions in advanced gate etching processes'

Authors :: Cunge, Gilles
Laboratoire des technologies de la microélectronique (LTM)
Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)
Boussey, Jumana
Source :: Thin Solid Films, Thin Solid Films, 2007, 515, pp.4748, Thin Solid Films, Elsevier, 2007, 515, pp.4748
Publication Year :: 2007
Publisher :: HAL CCSD, 2007.
Abstract: International audience

Subjects :: [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
ComputingMilieux_MISCELLANEOUS

Language :: English
ISSN :: 00406090
Database :: OpenAIRE
Journal :: Thin Solid Films, Thin Solid Films, 2007, 515, pp.4748, Thin Solid Films, Elsevier, 2007, 515, pp.4748
Accession number :: edsair.dedup.wf.001..e914b8b8447bc1fbf074256c1c26ea2d

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