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Thin film thickness measurement for evaluation of residual layer of nano-imprint lithography using near-field optics

Authors :
Minamiguchi, S.
Usuki, S.
Takahashi, S.
Kiyoshi Takamasu
Source :
Scopus-Elsevier

Details

Database :
OpenAIRE
Journal :
Scopus-Elsevier
Accession number :
edsair.dedup.wf.001..e26bab38379548f6d0f1483ab1ffe43c

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