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Mechanisms of diffusion and stability of properties of thin Ti-Ni-Au, W-Ni-Au and Mo-Ni-Au films on silicon
Details
- Database :
- OpenAIRE
- Journal :
- Scopus-Elsevier
- Accession number :
- edsair.dedup.wf.001..d2b064e52db554010bf0c5eb0b2eff22