Nanopatterning of plasma polymer thin films by ArF photolithography : Impact of polymer structure on patterning properties

Authors :: Dirani, Ali
Wieder, Fernand
Roucoules, Vincent
Airoudj, A.
Soppera, Olivier
Photomatériaux pour l'Optique et les Nanotechnologies (PHOTON LRC 7228)
Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))
Institut de Chimie des Sufaces et Interfaces (ICSI)
Centre National de la Recherche Scientifique (CNRS)
Turck, Colette
Source :: Plasma Processes and Polymers, Plasma Processes and Polymers, Wiley-VCH Verlag, 2010, 7 (7), pp.571-581
Publication Year :: 2010
Publisher :: HAL CCSD, 2010.
Abstract: International audience

Subjects :: [CHIM.MATE] Chemical Sciences/Material chemistry
[CHIM.POLY] Chemical Sciences/Polymers
[CHIM.POLY]Chemical Sciences/Polymers
[CHIM.MATE]Chemical Sciences/Material chemistry
ComputingMilieux_MISCELLANEOUS

Language :: English
ISSN :: 16128850 and 16128869
Database :: OpenAIRE
Journal :: Plasma Processes and Polymers, Plasma Processes and Polymers, Wiley-VCH Verlag, 2010, 7 (7), pp.571-581
Accession number :: edsair.dedup.wf.001..d27427bdfcb3108873ce77f074944d62

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