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Comparison between Sputtering and Atomic Layer Deposition of ferroelectric doped and undoped HfO2
- Source :
- EMRS Spring Meeting 2017, EMRS Spring Meeting 2017, May 2017, Strasbourg, France
- Publication Year :
- 2017
- Publisher :
- HAL CCSD, 2017.
-
Abstract
- International audience
- Subjects :
- [CHIM.MATE] Chemical Sciences/Material chemistry
[SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]
[CHIM.MATE]Chemical Sciences/Material chemistry
[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
[SPI.MAT] Engineering Sciences [physics]/Materials
ComputingMilieux_MISCELLANEOUS
[PHYS.COND.CM-MS] Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]
[SPI.MAT]Engineering Sciences [physics]/Materials
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- EMRS Spring Meeting 2017, EMRS Spring Meeting 2017, May 2017, Strasbourg, France
- Accession number :
- edsair.dedup.wf.001..b7e517625e6c874a0668c1f72cfbe4f5