Low-k epoxy silsesquioxane resists for UV nanoimprint lithography

MLA

Chouiki, M., et al. Low-k Epoxy Silsesquioxane Resists for UV Nanoimprint Lithography. Jan. 2007. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.dedup.wf.001..a4a6d093bb3ea6748185b411eb880bdb&authtype=sso&custid=ns315887.

APA

Chouiki, M., Ridaoui, H., Zelsmann, M., Boussey-Said, J., & De Girolamo, J. (2007). Low-k epoxy silsesquioxane resists for UV nanoimprint lithography.

Chicago

Chouiki, M., H. Ridaoui, M. Zelsmann, J. Boussey-Said, and J. De Girolamo. 2007. “Low-k Epoxy Silsesquioxane Resists for UV Nanoimprint Lithography,” January. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.dedup.wf.001..a4a6d093bb3ea6748185b411eb880bdb&authtype=sso&custid=ns315887.