Resistless Patterning of Quantum Nanostructures by Local Anodization with an Atomic Force Microscope

Authors :: Tonneau, D.
V., Bouchiat
M., Faucehr
T., Fournier
B., Pannetier
C., Thirion
N., Clement
D., Tonneau
H., Dallaoprta
V., Safarov
J.C., Villegier
D., Fraboulet
D., Mariolle
J., Gautier
Centre Interdisciplinaire de Nanoscience de Marseille (CINaM)
Aix Marseille Université (AMU)-Centre National de la Recherche Scientifique (CNRS)
Source :: Microelectronic Engineering, Microelectronic Engineering, Elsevier, 2002, 61-62, pp.517, Microelectronic Engineering, 2002, 61-62, pp.517
Publication Year :: 2002
Publisher :: HAL CCSD, 2002.
Abstract: International audience

Subjects :: [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]
ComputingMilieux_MISCELLANEOUS

Language :: English
ISSN :: 01679317 and 18735568
Database :: OpenAIRE
Journal :: Microelectronic Engineering, Microelectronic Engineering, Elsevier, 2002, 61-62, pp.517, Microelectronic Engineering, 2002, 61-62, pp.517
Accession number :: edsair.dedup.wf.001..78ceaaac1ac2c3618486f1ac29a61f2e

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