Cryogenic ALE of silicon oxide

Authors :: Holtzer, Nicolas
Tillocher, Thomas
Lefaucheux, Philippe
Dussart, Remi
Groupe de recherches sur l'énergétique des milieux ionisés (GREMI)
Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS)
Centre National de la Recherche Scientifique (CNRS)-Université d'Orléans (UO)
Source :: Plasma Etch and Strip in Microtechnology, Plasma Etch and Strip in Microtechnology, Oct 2017, Leuven, Belgium
Publication Year :: 2017
Publisher :: HAL CCSD, 2017.
Abstract: International audience

Subjects :: [SPI]Engineering Sciences [physics]
[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph]
[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
ComputingMilieux_MISCELLANEOUS

Language :: English
Database :: OpenAIRE
Journal :: Plasma Etch and Strip in Microtechnology, Plasma Etch and Strip in Microtechnology, Oct 2017, Leuven, Belgium
Accession number :: edsair.dedup.wf.001..71acbb3307ecbe84209b6f7485d8ff5c

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