Ultra-thin strained SOI substrate analysis by pseudo-MOS measurements

Authors :: Gallon C. Fenouillet-Béranger N. Bresson S. Cristoloveanu F. Allibert S. Bord C. Aulnette D. Delille E. Latu-Romain J.M. Hartmann T. Ernst F. Andrieu Y. Campidelli B. Ghyselen I. Cayrefourcq F. Fournel N. Kernevez T. Skotnicki, C.
Domenget, Chahla
Institut de Microélectronique, Electromagnétisme et Photonique (IMEP)
Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique de Grenoble (INPG)-Université Joseph Fourier - Grenoble 1 (UJF)
Université Joseph Fourier - Grenoble 1 (UJF)-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)
Source :: Microelectronic Engineering, Microelectronic Engineering, Elsevier, 2005, 80, pp.241-244, 14th Biennial Conf. on Insulating Films On Semiconductors (INFOS'05), 14th Biennial Conf. on Insulating Films On Semiconductors (INFOS'05), 2005, XX, pp.XX
Publication Year :: 2005
Publisher :: HAL CCSD, 2005.
Abstract: International audience

Subjects :: [SPI.ELEC]Engineering Sciences [physics]/Electromagnetism
[INFO.INFO-TS]Computer Science [cs]/Signal and Image Processing
[INFO.INFO-TS] Computer Science [cs]/Signal and Image Processing
[SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
[SPI.ELEC] Engineering Sciences [physics]/Electromagnetism
[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
[SPI.SIGNAL]Engineering Sciences [physics]/Signal and Image processing
ComputingMilieux_MISCELLANEOUS
[SPI.SIGNAL] Engineering Sciences [physics]/Signal and Image processing

Language :: English
ISSN :: 01679317 and 18735568
Database :: OpenAIRE
Journal :: Microelectronic Engineering, Microelectronic Engineering, Elsevier, 2005, 80, pp.241-244, 14th Biennial Conf. on Insulating Films On Semiconductors (INFOS'05), 14th Biennial Conf. on Insulating Films On Semiconductors (INFOS'05), 2005, XX, pp.XX
Accession number :: edsair.dedup.wf.001..675436383200075c5699f7867b6b4c95

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