Back to Search
Start Over
Sealing of porous low-k dielectric materials: UV-O3 oxidised CVD silicon oxycarbide films
- Source :
- Physicalia Magazine, 24, 201-210, University of Groningen
- Publication Year :
- 2002
Details
- Language :
- Dutch; Flemish
- Database :
- OpenAIRE
- Journal :
- Physicalia Magazine, 24, 201-210, University of Groningen
- Accession number :
- edsair.dedup.wf.001..4ff52046e8c869579eb9235012a3400f