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HfO2 films grown by ALD using cyclopentadienyl-type precursors and H2O or O-3 as oxygen source

Authors :
Niinisto, J.
Putkonen, M.
Niinisto, L.
Arstila, K.
Timo Sajavaara
Lu, J.
Kukli, K.
Ritala, M.
Leskela, M.
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Database :
OpenAIRE
Journal :
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Accession number :
edsair.dedup.wf.001..4f328020abef9c222c256c5ba9406e40

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