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Tracking polarization loss and imprint during electrical tests in sputtered TiN/HZO/TiN capacitors
- Source :
- Novel high-k workshop applications, Novel high-k workshop applications, NamLab, Apr 2021, Dresden, Germany, HAL
- Publication Year :
- 2021
- Publisher :
- HAL CCSD, 2021.
-
Abstract
- International audience
- Subjects :
- [CHIM.MATE] Chemical Sciences/Material chemistry
[SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]
[CHIM.MATE]Chemical Sciences/Material chemistry
[SPI.MAT] Engineering Sciences [physics]/Materials
[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
[PHYS.COND.CM-MS] Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]
ComputingMilieux_MISCELLANEOUS
[SPI.MAT]Engineering Sciences [physics]/Materials
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- Novel high-k workshop applications, Novel high-k workshop applications, NamLab, Apr 2021, Dresden, Germany, HAL
- Accession number :
- edsair.dedup.wf.001..30f85f88c401de5d64a463c7b1d65970