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Tracking polarization loss and imprint during electrical tests in sputtered TiN/HZO/TiN capacitors

Details

Language :
English
Database :
OpenAIRE
Journal :
Novel high-k workshop applications, Novel high-k workshop applications, NamLab, Apr 2021, Dresden, Germany, HAL
Accession number :
edsair.dedup.wf.001..30f85f88c401de5d64a463c7b1d65970