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SiO2 etching characteristics using UHF plasma source

Authors :
Nogami, H.
Wani, E.
Nakagawa, Y.
Mashimo, K.
Seiji Samukawa
Tsukada, T.
Source :
ResearcherID, Scopus-Elsevier

Details

Database :
OpenAIRE
Journal :
ResearcherID, Scopus-Elsevier
Accession number :
edsair.dedup.wf.001..1abb85b3db392dae47ddce8f7f8eacc1

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