Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose

Authors :: Löfstrand, Anette
Suyatin, Dmitry B.
Nilsson, Nicklas
Otsuka, Issei
Kvennefors, A.
Ring, J.
Borsali, Redouane
Maximov, Ivan
Otsuka, Issei
Centre de Recherches sur les Macromolécules Végétales (CERMAV )
Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])
Source :: The 5th DSA Symposium, The 5th DSA Symposium, Oct 2019, Milan, Italy
Publication Year :: 2019
Publisher :: HAL CCSD, 2019.
Abstract: International audience

Subjects :: [CHIM.POLY] Chemical Sciences/Polymers
[CHIM.POLY]Chemical Sciences/Polymers
[SPI.GPROC] Engineering Sciences [physics]/Chemical and Process Engineering
[SPI.GPROC]Engineering Sciences [physics]/Chemical and Process Engineering
[SPI.MAT] Engineering Sciences [physics]/Materials
ComputingMilieux_MISCELLANEOUS
[SPI.MAT]Engineering Sciences [physics]/Materials

Language :: English
Database :: OpenAIRE
Journal :: The 5th DSA Symposium, The 5th DSA Symposium, Oct 2019, Milan, Italy
Accession number :: edsair.dedup.wf.001..1aa5a810742d08e672d2cb7ff7b17135

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