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Self-planarizing process for shallow trench isolation

Authors :
Fazio B.
Currò G.
Nastasi N.
Source :
United States Patent 6,573,152, Internazionale
Publication Year :
2003

Subjects

Subjects :
Microelectronics
Nanotecnologie

Details

Language :
English
Database :
OpenAIRE
Journal :
United States Patent 6,573,152, Internazionale
Accession number :
edsair.cnr...........4d61244af06e673f049b837808b518b9

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Authors Abstract Subjects Details