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Characteristics of α-SiC: H films produced by the r.f. plasma pulsed deposition method — Effect of deposition temperature
- Source :
- Carbon; 1998, Vol. 36 Issue: 12 p1874-1874, 1p
- Publication Year :
- 1998
Details
- Language :
- English
- ISSN :
- 00086223
- Volume :
- 36
- Issue :
- 12
- Database :
- Supplemental Index
- Journal :
- Carbon
- Publication Type :
- Periodical
- Accession number :
- ejs8721624
- Full Text :
- https://doi.org/10.1016/S0008-6223(98)90066-5