Cite
Optical and structural properties of silicon nitride thin films deposited by plasma enhanced chemical vapor deposition for high reflectance optical mirrors
MLA
Lequime, Michel, et al. “Optical and Structural Properties of Silicon Nitride Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition for High Reflectance Optical Mirrors.” Proceedings of SPIE, vol. 13020, no. 1, June 2024, p. 130200T–130200T–12. EBSCOhost, https://doi.org/10.1117/12.3022947.
APA
Lequime, M., Ristau, D., Saunders, K., Mazur, M., Clark, C., Gibson, D., & Garcia Nuñez, C. (2024). Optical and structural properties of silicon nitride thin films deposited by plasma enhanced chemical vapor deposition for high reflectance optical mirrors. Proceedings of SPIE, 13020(1), 130200T–130200T–12. https://doi.org/10.1117/12.3022947
Chicago
Lequime, Michel, Detlev Ristau, Kirstin Saunders, Michał Mazur, Caspar Clark, Des Gibson, and Carlos Garcia Nuñez. 2024. “Optical and Structural Properties of Silicon Nitride Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition for High Reflectance Optical Mirrors.” Proceedings of SPIE 13020 (1): 130200T–130200T–12. doi:10.1117/12.3022947.