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Dry etch challenges for patterning middle-of-line (MOL) contact trench in monolithic CFET (complementary FET)
- Source :
- Proceedings of SPIE; April 2024, Vol. 12958 Issue: 1 p129580B-129580B-9, 1166230p
- Publication Year :
- 2024
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12958
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs66210881
- Full Text :
- https://doi.org/10.1117/12.3014213