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Toward Monolithic GaN on Si Inter-Sub-Band Infrared Optoelectronics
- Source :
- IEEE Transactions on Electron Devices; 2024, Vol. 71 Issue: 4 p2497-2502, 6p
- Publication Year :
- 2024
-
Abstract
- We have successfully demonstrated the first CMOS-compatible monolithic epitaxial integration of GaN-based infrared (IR) detectors on Si. The device is a GaN/AlGaN quantum cascade detector (QCD) grown selectively in windows on a 4-in Si (111) substrate using plasma-assisted molecular beam epitaxy. The CMOS compatibility of the QCD growth method was verified by applying it to Si circuitry fabricated on (100) surface of a double hetero-oriented silicon on insulator (SOI) substrate. The photo signal, centered at a wavelength of 4.6 <inline-formula> <tex-math notation="LaTeX">$\mu \text{m}$ </tex-math></inline-formula>, was measured at 110 K. The zero-bias responsivity of 81 <inline-formula> <tex-math notation="LaTeX">$\mu \text{A}$ </tex-math></inline-formula>/W at 18 K and detectivity of <inline-formula> <tex-math notation="LaTeX">$1.2\times 10^{{7}}$ </tex-math></inline-formula> Jones were recorded.
Details
- Language :
- English
- ISSN :
- 00189383 and 15579646
- Volume :
- 71
- Issue :
- 4
- Database :
- Supplemental Index
- Journal :
- IEEE Transactions on Electron Devices
- Publication Type :
- Periodical
- Accession number :
- ejs65972023
- Full Text :
- https://doi.org/10.1109/TED.2024.3370140