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Platinum-based alloy absorber with improved etching properties for next-generation EUV mask

Authors :
Naulleau, Patrick P.
Gargini, Paolo A.
Itani, Toshiro
Ronse, Kurt G.
Kim, Yunsoo
Jeong, Dongmin
Lee, Seungho
Ahn, Jinho
Source :
Proceedings of SPIE; November 2023, Vol. 12750 Issue: 1 p127500R-127500R-5, 1147506p
Publication Year :
2023

Details

Language :
English
ISSN :
0277786X
Volume :
12750
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs64715811
Full Text :
https://doi.org/10.1117/12.2685114