Back to Search
Start Over
Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula
- Source :
- Proceedings of SPIE; November 2023, Vol. 12750 Issue: 1 p127500D-127500D-8, 1147509p
- Publication Year :
- 2023
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12750
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs64715791
- Full Text :
- https://doi.org/10.1117/12.2688029