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Examination of Ferroelectric FET for “Cold” Nonvolatile Memory
- Source :
- IEEE Transactions on Electron Devices; August 2023, Vol. 70 Issue: 8 p4122-4127, 6p
- Publication Year :
- 2023
-
Abstract
- HfZrO<subscript>x</subscript>-based Si n-/p-type ferroelectric field-effect transistors (n/pFEFETs) were investigated from 300 to 82 K with pulse measurements, which disclosed device physics at low temperatures. Moreover, FEFET shows extremely improved performance (read-after-write latency < 100 ns and write endurance<inline-formula> <tex-math notation="LaTeX">$10^{{10}}$ </tex-math></inline-formula> cycles with no device degradation) at 82 K. Even the lower write voltage is feasible at 82 K than at 300 K although the coercive field increases. The enhancement is attributed to frozen trap sites and increased coercive field at 82 K. Our work not only shows a deep understanding of device physics but also proposes that FEFET could be a promising cold memory.
Details
- Language :
- English
- ISSN :
- 00189383 and 15579646
- Volume :
- 70
- Issue :
- 8
- Database :
- Supplemental Index
- Journal :
- IEEE Transactions on Electron Devices
- Publication Type :
- Periodical
- Accession number :
- ejs63625963
- Full Text :
- https://doi.org/10.1109/TED.2023.3278611