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An optical critical dimension (OCD) model analysis on 3nm complementary FET (CFET) gate stacks

Authors :
Robinson, John C.
Sendelbach, Matthew J.
Wang, Qi
Wei, Yayi
Wu, Qiang
Li, Yanli
Liu, Xianhe
Source :
Proceedings of SPIE; April 2023, Vol. 12496 Issue: 1 p124962Q-124962Q-4, 1124663p
Publication Year :
2023

Details

Language :
English
ISSN :
0277786X
Volume :
12496
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs63133508
Full Text :
https://doi.org/10.1117/12.2657944