Back to Search
Start Over
Patterning assessment using 0.33NA EUV single mask for next generation DRAM manufacturing
- Source :
- Proceedings of SPIE; April 2023, Vol. 12495 Issue: 1 p124950S-124950S-11, 12370062p
- Publication Year :
- 2023
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12495
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs63125979
- Full Text :
- https://doi.org/10.1117/12.2660763