Pit Formation, Patterning and Flattening of Ge Surfaces in O2-Containing Water by Metal-Assisted Chemical Etching

MLA

Kawase, Tatsuya, et al. “Pit Formation, Patterning and Flattening of Ge Surfaces in O2-Containing Water by Metal-Assisted Chemical Etching.” ECS Transactions, vol. 75, no. 1, Aug. 2016. EBSCOhost, https://doi.org/10.1149/07501.0107ecst.

APA

Kawase, T., Mura, A., Saito, Y., Okamoto, T., Kawai, K., Sano, Y., Yamauchi, K., Morita, M., & Arima, K. (2016). Pit Formation, Patterning and Flattening of Ge Surfaces in O2-Containing Water by Metal-Assisted Chemical Etching. ECS Transactions, 75(1). https://doi.org/10.1149/07501.0107ecst

Chicago

Kawase, Tatsuya, Atsushi Mura, Yusuke Saito, Takeshi Okamoto, Kentaro Kawai, Yasuhisa Sano, Kazuto Yamauchi, Mizuho Morita, and Kenta Arima. 2016. “Pit Formation, Patterning and Flattening of Ge Surfaces in O2-Containing Water by Metal-Assisted Chemical Etching.” ECS Transactions 75 (1). doi:10.1149/07501.0107ecst.